首页> 外文OA文献 >Research update: Enhanced energy storage density and energy efficiency of epitaxial Pb0.9La0.1(Zr0.52Ti0.48)O3 relaxor-ferroelectric thin-films deposited on silicon by pulsed laser deposition
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Research update: Enhanced energy storage density and energy efficiency of epitaxial Pb0.9La0.1(Zr0.52Ti0.48)O3 relaxor-ferroelectric thin-films deposited on silicon by pulsed laser deposition

机译:研究更新:通过脉冲激光沉积在硅上沉积的外延Pb0.9La0.1(Zr0.52Ti0.48)O3弛豫铁电薄膜提高了储能密度和能效

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摘要

Pb 0.9La0.1(Zr0.52Ti0.48)O3 (PLZT) relaxor-ferroelectric thin films were grown on SrRuO3/SrTiO3/Si substrates by pulsed laser deposition. A large recoverable storage density (U reco) of 13.7 J/cm3 together with a high energy efficiency (η) of 88.2% under an applied electric field of 1000 kV/cm and at 1 kHz frequency was obtained in 300-nm-thick epitaxial PLZT thin films. These high values are due to the slim and asymmetric hysteresis loop when compared to the values in the reference undoped epitaxial lead zirconate titanate Pb(Zr0.52Ti0.48)O3 ferroelectric thin films (U reco = 9.2 J/cm3 and η = 56.4%) which have a high remanent polarization and a small shift in the hysteresis loop, under the same electric field.
机译:通过脉冲激光沉积在SrRuO3 / SrTiO3 / Si衬底上生长了Pb 0.9La0.1(Zr0.52Ti0.48)O3(PLZT)弛豫铁电薄膜。在300 nm厚的外延层中,在1000 kV / cm的施加电场和1 kHz频率下,可获得13.7 J / cm3的大可恢复存储密度(U reco),以及88.2%的高能量效率(η) PLZT薄膜。与参比的未掺杂外延钛酸锆钛酸铅Pb(Zr0.52Ti0.48)O3铁电薄膜中的值相比,这些高值是由于纤细且不对称的磁滞回线(U reco = 9.2 J / cm3和η= 56.4%在相同电场下具有较高的剩余极化和磁滞回线中的小位移。

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